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第三届国际先进光刻技术研讨会报名开启
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【IWAPS 2019】报名开启
 第三届国际先进光刻技术研讨会
IWAPS 2019
10月17-18日, 南京, 金陵江滨酒店
Oct. 17-18, Nanjing, China
 Nanjing Jinling Riverside Hotel
 ▼长按报名▼



主办单位



集成电路产业技术创新联盟

中国光学学会

承办单位


中国科学院微电子研究所

南京浦口高新区

组委会




论文征集
CALL FOR PAPERS

投稿邮箱(Email)
 jomm_iwaps@ime.ac.cn
 
接收论文主题
SCOPE OF PAPERS
 
  IWAPS致力于发表前沿的微电子制造技术研究成果。会议主题涵盖先进半导体制造领域中从早期的理论和实验,到工业化大规模量产的应用等内容。包括但不局限于:
1.光刻 
2.极紫外光刻
3.新型技术
4.量测及缺陷检测
5.设计工艺联合优化(DTCO)与可制造性设计(DFM) 材料
6.器件
7.工艺
 
IWAPS is devoted to publishing research on the cutting-edge microelectronic manufacturing technology. The scope of the conference covers studies of advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. The perspective scope includes, but is not limited to the following areas:
Optical Lithography  Extreme Ultraviolet (EUV) Lithography  Advanced Patterning Technologies Metrology, Inspection and Testing Design and Technology Co-optimization and Design for Manufacturability Materials Device Process
 
接收的会议稿件择优将于《Journal of Microelectronic Manufacturing》上全文发表,并且给最佳论文作者颁发年度奖项。
Full length manuscripts of accepted papers will be considered for publication in the Journal of Microelectronic Manufacturing (JoMM).And IWAPS will present an annual award to the author of the paper judged to be the Best Paper.
 
摘要要求 
ABSTRACT INSTRUCTIONS 
 
摘要必须清楚地描述论文的性质、研究主题、研究内容、组织结构、要点以及研究意义。且用英文撰写。
摘要必须包括以下内容:论文标题、关键词、作者的姓名、所属单位、邮件地址和通讯地址。摘要的字数不应超过500个单词。对研究内容的细节的描述将增加稿件被接收的可能。同时,我们强烈建议在提交的摘要中使用图表。
在截止日期之后提交的摘要将根据具体情况进行审议。
The abstract must clearly describe the nature, scope, content, organization, key points and significance of the proposed paper.   
The ABSTRACT must include paper title, key words, author name, affiliation and full contact information (email and address). The Word of Abstract limit is up to 500 words. Introductory paragraph describing the intended content of your conference is a huge plus to your papers. Graphs are highly encouraged in the submitted abstract.   
Abstracts submitted after the published deadline will be considered on a case-by-case basis.   
 
报告要求 
PRESENTATION INSTRUCTIONS 
 
口头报告(For oral presenters):
被选作进行口头报告的作者,应当参加2019年的IWAPS 会议并用英文进行15分钟与论文相关的技术报告。演讲者应当预先提供其会议报告的PPT。PPT应于2019年10月15日前发送至邮箱jomm_iwaps@ime.ac.cn
Authors of papers selected for oral presentation shall attend IWAPS 2019 and give a 15 minutes technical overview presentation about your paper. Speakers are responsible for providing a PPT in advance to be uploaded for presentation at the conference. The PPT Due is October 15th 2019. Please send PPT to jomm_iwaps@ime.ac.cn before the due date. 
 
海报展示(For poster presenters):
被选作进行海报展示的作者,可于展示当日上午9点起张贴海报。展板上将印有按序排列的论文编号,请按论文编号将海报张贴在相应位置。会场将提供图钉用于海报张贴。
Authors of papers selected for poster presentation may set up their posters from 9:00 am on the day of the poster session. Paper numbers will be posted on the poster boards in numerical order, please find your paper number and post your poster in the designated space. Poster supplies (push-pins) will be available. 
 
关于JOMM 
ABOUT JOMM
 
Journal of Microelectronic Manufacturing
ISSN: 2578-3769
www.jommpublish.org
JoMM是由中国科学院微电子研究所创办的国际化同行评议学术期刊,旨在发表集成电路制造领域中从实验室理论阶段到工业化大规模量产阶段的研究成果。JoMM 现征2019 年各期稿件。JoMM追求高效的出版周期,文章一经接收将马上上线 ,并免2019年版面费,欢迎投稿!
JoMM is an international peer-reviewed journal founded by the Institute of Microelectronics of Chinese Academy of Sciences (IMECAS). JoMM aims at reporting the progress on the cutting-edge advanced semiconductor manufacturing sciences and technologies from fundamental research to industrial high volume manufacturing applications. JoMM is inviting papers for 2019 issues. JoMM strives for shortened publication cycle, articles are published online as soon as accepted. And the publication charge is FREE for 2019.
 
关于IWAPS 
ABOUT IWAPS
 
2017年IWAPS在北京
 链接:首届国际先进光刻技术研讨会胜利闭幕



2018年IWAPS在厦门
 链接:第二届国际先进光刻技术研讨会胜利闭幕



2019年IWAPS在南京
链接:十月,来南京干一票大的!



IWAPS 2019 会议筹备工作已经展开
更多信息,敬请关注会议官网
www.iwaps.org/cn
以及“光刻人的世界”微信公众号
我们会随时更新

2019年10月17-18日  相约南京



 
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